Winning first prize for conceptual design, the Polish Pavilion created for the upcoming 2010 World Expo in Shanghai is a surface design masterpiece. The pavilion draws inspiration from traditional Polish folk-art paper cut-outs. The delicate exterior looks equally impressive in day light as well as at night. The design team included Wojciech Kakowski, Natalia Paszkowska, Marcin Mostafa.

photo thanks to polish pavilion